IT1113672B - Processo per formare una regione a circuito integrato di silicio mediante impiantamento di ioni di arsenico e germanio - Google Patents

Processo per formare una regione a circuito integrato di silicio mediante impiantamento di ioni di arsenico e germanio

Info

Publication number
IT1113672B
IT1113672B IT29282/77A IT2928277A IT1113672B IT 1113672 B IT1113672 B IT 1113672B IT 29282/77 A IT29282/77 A IT 29282/77A IT 2928277 A IT2928277 A IT 2928277A IT 1113672 B IT1113672 B IT 1113672B
Authority
IT
Italy
Prior art keywords
integrated circuit
circuit region
silicon integrated
germanium ions
implanting arsenic
Prior art date
Application number
IT29282/77A
Other languages
English (en)
Italian (it)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT1113672B publication Critical patent/IT1113672B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
    • H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
    • H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
    • H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
    • H10D62/834—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge further characterised by the dopants
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/024—Defect control-gettering and annealing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/061—Gettering-armorphous layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/938—Lattice strain control or utilization

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Toxicology (AREA)
  • Recrystallisation Techniques (AREA)
  • Bipolar Transistors (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Element Separation (AREA)
  • Formation Of Insulating Films (AREA)
IT29282/77A 1976-12-06 1977-11-03 Processo per formare una regione a circuito integrato di silicio mediante impiantamento di ioni di arsenico e germanio IT1113672B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/748,035 US4111719A (en) 1976-12-06 1976-12-06 Minimization of misfit dislocations in silicon by double implantation of arsenic and germanium

Publications (1)

Publication Number Publication Date
IT1113672B true IT1113672B (it) 1986-01-20

Family

ID=25007704

Family Applications (1)

Application Number Title Priority Date Filing Date
IT29282/77A IT1113672B (it) 1976-12-06 1977-11-03 Processo per formare una regione a circuito integrato di silicio mediante impiantamento di ioni di arsenico e germanio

Country Status (14)

Country Link
US (2) US4111719A (en])
JP (1) JPS5370668A (en])
AU (1) AU507591B2 (en])
BE (1) BE860359A (en])
BR (1) BR7707919A (en])
CA (1) CA1075831A (en])
CH (1) CH623685A5 (en])
DE (1) DE2752439C3 (en])
ES (1) ES464680A1 (en])
FR (1) FR2379162A1 (en])
GB (1) GB1536618A (en])
IT (1) IT1113672B (en])
NL (1) NL7713449A (en])
SE (1) SE425529B (en])

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* Cited by examiner, † Cited by third party
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US4369072A (en) * 1981-01-22 1983-01-18 International Business Machines Corp. Method for forming IGFET devices having improved drain voltage characteristics
JPS5935425A (ja) * 1982-08-23 1984-02-27 Toshiba Corp 半導体装置の製造方法
GB2133618B (en) * 1983-01-05 1986-09-10 Gen Electric Co Plc Fabricating semiconductor circuits
US4603471A (en) * 1984-09-06 1986-08-05 Fairchild Semiconductor Corporation Method for making a CMOS circuit having a reduced tendency to latch by controlling the band-gap of source and drain regions
US4728998A (en) * 1984-09-06 1988-03-01 Fairchild Semiconductor Corporation CMOS circuit having a reduced tendency to latch
US4837173A (en) * 1987-07-13 1989-06-06 Motorola, Inc. N-channel MOS transistors having source/drain regions with germanium
US4928156A (en) * 1987-07-13 1990-05-22 Motorola, Inc. N-channel MOS transistors having source/drain regions with germanium
JPH01220822A (ja) * 1988-02-29 1989-09-04 Mitsubishi Electric Corp 化合物半導体装置の製造方法
US4835112A (en) * 1988-03-08 1989-05-30 Motorola, Inc. CMOS salicide process using germanium implantation
US5097308A (en) * 1990-03-13 1992-03-17 General Instrument Corp. Method for controlling the switching speed of bipolar power devices
US5298435A (en) * 1990-04-18 1994-03-29 National Semiconductor Corporation Application of electronic properties of germanium to inhibit n-type or p-type diffusion in silicon
US5095358A (en) * 1990-04-18 1992-03-10 National Semiconductor Corporation Application of electronic properties of germanium to inhibit n-type or p-type diffusion in silicon
US5316958A (en) * 1990-05-31 1994-05-31 International Business Machines Corporation Method of dopant enhancement in an epitaxial silicon layer by using germanium
US5266510A (en) * 1990-08-09 1993-11-30 Micron Technology, Inc. High performance sub-micron p-channel transistor with germanium implant
US5108935A (en) * 1990-11-16 1992-04-28 Texas Instruments Incorporated Reduction of hot carrier effects in semiconductor devices by controlled scattering via the intentional introduction of impurities
US5108954A (en) * 1991-09-23 1992-04-28 Micron Technology, Inc. Method of reducing contact resistance at silicide/active area interfaces and semiconductor devices produced according to the method
US5420055A (en) * 1992-01-22 1995-05-30 Kopin Corporation Reduction of parasitic effects in floating body MOSFETs
US5426069A (en) * 1992-04-09 1995-06-20 Dalsa Inc. Method for making silicon-germanium devices using germanium implantation
KR0123434B1 (ko) * 1994-02-07 1997-11-26 천성순 실리콘 웨이퍼에서의 부정합전위의 발생을 억제화하기 위한 링패턴 형성방법 및 그 구조
JP3243146B2 (ja) 1994-12-08 2002-01-07 株式会社東芝 半導体装置
JP2002504270A (ja) * 1998-04-09 2002-02-05 コーニンクレッカ、フィリップス、エレクトロニクス、エヌ、ヴィ 整流接合を有する半導体デバイスおよび該半導体デバイスの製造方法
US6030863A (en) * 1998-09-11 2000-02-29 Taiwan Semiconductor Manufacturing Company Germanium and arsenic double implanted pre-amorphization process for salicide technology
US6262456B1 (en) 1998-11-06 2001-07-17 Advanced Micro Devices, Inc. Integrated circuit having transistors with different threshold voltages
US6114206A (en) * 1998-11-06 2000-09-05 Advanced Micro Devices, Inc. Multiple threshold voltage transistor implemented by a damascene process
GB9826519D0 (en) * 1998-12-02 1999-01-27 Arima Optoelectronics Corp Semiconductor devices
US20040121524A1 (en) * 2002-12-20 2004-06-24 Micron Technology, Inc. Apparatus and method for controlling diffusion
US7297617B2 (en) * 2003-04-22 2007-11-20 Micron Technology, Inc. Method for controlling diffusion in semiconductor regions
US7253071B2 (en) * 2004-06-02 2007-08-07 Taiwan Semiconductor Manufacturing Company Methods for enhancing the formation of nickel mono-silicide by reducing the formation of nickel di-silicide
US8110469B2 (en) 2005-08-30 2012-02-07 Micron Technology, Inc. Graded dielectric layers
EP4104214A4 (en) * 2020-02-11 2024-03-27 Qromis, Inc. METHOD AND SYSTEM FOR DIFFUSING MAGNESIUM IN GALLIUM NITRIDE MATERIALS USING SPUTTERED MAGNESIUM SOURCES

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL204025A (en]) * 1955-03-23
US3485684A (en) * 1967-03-30 1969-12-23 Trw Semiconductors Inc Dislocation enhancement control of silicon by introduction of large diameter atomic metals
US3836999A (en) * 1970-09-21 1974-09-17 Semiconductor Res Found Semiconductor with grown layer relieved in lattice strain
US3943016A (en) * 1970-12-07 1976-03-09 General Electric Company Gallium-phosphorus simultaneous diffusion process
NL161920C (nl) * 1971-03-12 1980-03-17 Hitachi Ltd Werkwijze voor het vervaardigen van een half- geleiderinrichting, waarbij de roostervervorming t.g.v. doteerstoffen wordt gecompenseerd.
JPS50116274A (en]) * 1974-02-27 1975-09-11

Also Published As

Publication number Publication date
GB1536618A (en) 1978-12-20
US4111719A (en) 1978-09-05
NL7713449A (nl) 1978-06-08
SE425529B (sv) 1982-10-04
ES464680A1 (es) 1979-01-01
AU3034977A (en) 1979-05-10
DE2752439A1 (de) 1978-06-08
CH623685A5 (en]) 1981-06-15
US4137103A (en) 1979-01-30
SE7713736L (sv) 1978-06-07
BE860359A (fr) 1978-02-15
DE2752439B2 (de) 1980-05-22
BR7707919A (pt) 1978-09-05
DE2752439C3 (de) 1981-01-29
AU507591B2 (en) 1980-02-21
FR2379162B1 (en]) 1980-12-19
FR2379162A1 (fr) 1978-08-25
CA1075831A (en) 1980-04-15
JPS5370668A (en) 1978-06-23

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